Taiwan Vacuum Coating Services Keywords www.vacuum-guide.com

Vacuum coating systems (Equipment) Parylene Sputter source Sputter target
vacuum components
Asia Pacific   CN TAIWAN


Applied Optivac Technology, Inc. - www.aot-tek.com
- 5F, 898, Jingguo Rd., Luzhu Dist., Taoyuan City 33858, Taiwan

email, Tel.

Applied Optivac Technology, Inc. has been devoted in plasma process development and optimization for years. We know what you need and we can provide the solution for your plasma applications.
products: AOT Customized Plasma Application Solutions
  • PLASUS a solution provider in state-of-the-art OES tools for researches and industrials.
  • MAGPULS a solution provider in pulsed DC, MF and HIPIMS power supply.
  • Kaitek a solution provider in DC plasma power supply.
  • Thin Film Consulting, a solution provider in magnetron sputtering source.


Creating Nano Technologies Creating Nano Technologies, Inc. - www.creating-nanotech.com
- No.59, Aly. 21, Ln. 279, Zhongzheng Rd., Yongkang Dist., Tainan City 710, Taiwan

email: cnt.nano@msa.hinet.net, Tel. 06-2323927

Creating NanoTechnologies, Inc. has already researched and developed for more than 10 years. Creating Nano is a leader in domestic plasma's know-how and we are also the biggest domestic plasma equipment. Many panel marker companies have used great amount of our products that are stable and reliable and they also upgrade panel products yield and reliability.
products: Low Pressure Plasma

Plasma Cleaner PC03/PC04
Plasma Asher PA03B
Plasma Desmear PD06
Plasma Edga Isolation PI01
ODM Service


Surftech vacuum coating SURFTECH - www.surftech.com.tw
- 17, 41st Road, Taichung Ind. Park, Taichung, Taiwan (R.O.C.)

email: surftech@ms18.hinet.net, Tel. +886-4-23597813
products: Cathodic Arc Evaporation and Unbalanced Magnetron Sputtering

SURFTECH proudly introduces two lines of engineering service, Cathodic Arc Evaporation and Unbalanced Magnetron Sputtering, to provide improved oxidation, wear, friction, and lubrication properties to cutting tools and engineering components. Characterized by its ultra-thin thickness, superior adhesion to substrate surfaces, combination of hardness and toughness, and the capability to deposit at substrate temperatures below 200°C.

 

 

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